Dec 10, 2020 – CSU Among Laser Focus World’s Top 20 Photonics Advances

Researchers at Colorado State University have developed an improved IBS process that can deposit high-optical-quality silicon dioxide (SiO2) thin films with greatly reduced residual stress. Thin-film deposition processes, in particular ion-beam sputtering (IBS), for multilayer optical coatings can cause stress in the coatings, which in turn can stress the underlying optic, possibly warping it.